DocumentCode
1771150
Title
Anisotropically etched silicon surfaces for planar plasmonic terahertz guidedwave devices
Author
Kumar, Girish ; Shanshan Li ; Jadidi, Mohammad M. ; Murphy, Thomas E.
Author_Institution
Dept. of Phys., Indian Inst. of Technol. Guwahati, Guwahati, India
fYear
2014
fDate
8-13 June 2014
Firstpage
1
Lastpage
2
Abstract
We report a terahertz waveguide fabricated from doped crystalline silicon. Anisotropic chemically etching is used to produce a periodic array of concave pyramidal troughs in the silicon that provide confinement in both transverse directions.
Keywords
optical fabrication; optical materials; optical planar waveguides; semiconductor doping; silicon; terahertz wave devices; Si:B; anisotropic chemically etching; anisotropically etched silicon surfaces; concave pyramidal troughs; doped crystalline silicon; periodic array; planar plasmonic terahertz guided wave devices; terahertz waveguide fabrication; transverse directions; Optical device fabrication; Optical surface waves; Optical waveguides; Resonant frequency; Silicon; Surface waves;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics (CLEO), 2014 Conference on
Conference_Location
San Jose, CA
Type
conf
Filename
6989288
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