• DocumentCode
    1771232
  • Title

    Comparison of VO2 thin films deposited by pulsed laser, electron-beam and sputter deposition

  • Author

    Marvel, R.E. ; Harl, R.R. ; Rogers, B.R. ; Haglund, R.F.

  • Author_Institution
    Phys. Dept., Vanderbilt Univ., Vanderbilt, TN, USA
  • fYear
    2014
  • fDate
    8-13 June 2014
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    The optical performance and morphology of VO2 thins films deposited by electron beam evaporation, rf magnetron sputtering and pulsed laser deposition are compared. Laser-deposited films are strongly affected by substrate dewetting and epitaxial mismatch.
  • Keywords
    electron beam deposition; epitaxial growth; epitaxial layers; pulsed laser deposition; sputter deposition; vanadium compounds; VO2; electron beam evaporation; electron-beam deposition; epitaxial mismatch; morphological property; optical performance; pulsed laser deposition; rf magnetron sputtering; sputter deposition; substrate dewetting; thin film deposition; Annealing; Optical films; Optical imaging; Sputtering; Substrates; Ultrafast optics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2014 Conference on
  • Conference_Location
    San Jose, CA
  • Type

    conf

  • Filename
    6989331
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1771232