• DocumentCode
    1774974
  • Title

    Crystalline structures of YAlO3 single crystal at high temperatures

  • Author

    Inoue, Takeru ; Morimoto, Takuya ; Kaneko, Shin ; Horii, Yasushi ; Ohki, Y.

  • Author_Institution
    Dept. of Electr. Eng. & Biosci., Waseda Univ., Tokyo, Japan
  • fYear
    2014
  • fDate
    1-5 June 2014
  • Firstpage
    208
  • Lastpage
    211
  • Abstract
    In order to clarify the influence of high temperature annealing on a next-generation gate insulating material YAlO3, single crystal YAlO3 samples were annealed at various temperatures from 900 to 1300°C in air for about 12 hours. The crystalline structure was examined by X-ray diffractometry, while the surface profile was examined by atomic force microscopy and a surface profilometer. Furthermore, infrared absorption spectroscopy and optical microscopy were used. As a result, the following serial changes in structure were estimated. The perovskite structure of crystalline YAlO3 starts to collapse and Y3Al5O12 (YAG) is formed by the annealing at 1160 °C. Then, it segregates to Al2O3 andYAlO3 after the annealing at 1300 °C.
  • Keywords
    X-ray diffraction; annealing; atomic force microscopy; crystal structure; high-temperature effects; infrared spectra; optical microscopy; surface structure; yttrium compounds; X-ray diffractometry; YAlO3; annealing; atomic force microscopy; infrared absorption spectroscopy; next-generation gate insulating material; optical microscopy; perovskite crystalline structure; single crystal; surface profile; surface profilometry; temperature 900 degC to 1300 degC; Annealing; Crystals; Silicon carbide; X-ray scattering; Structural changes; Thermal annealing; X-ray diffractometry; YAlO3;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Insulating Materials (ISEIM), Proceedings of 2014 International Symposium on
  • Conference_Location
    Niigata
  • Type

    conf

  • DOI
    10.1109/ISEIM.2014.6870755
  • Filename
    6870755