DocumentCode :
1777041
Title :
Fabrication and characterization of junctionless MOSFETs for sensor applications
Author :
Zaborowski, Michal ; Tomaszewski, Daniel ; Malesinska, Jolanta ; Grabiec, Piotr
Author_Institution :
Div. of Silicon Microsyst. & Nanostruct. Technol., Inst. Technol. Elektron. (ITE), Piaseczno, Poland
fYear :
2014
fDate :
19-21 June 2014
Firstpage :
367
Lastpage :
371
Abstract :
A method for fabrication of junctionless SOI MOS devices for sensor applications is presented in the paper. Two groups of devices, namely FinFET-type devices, and wide MOSFETs have been designed and manufactured in a single process sequence on the same wafer. Electrical measurements of the MOSFETs as well characterization work have been carried out. The characterization work is based on a proposed model of junctionless MOSFETs and is focused on analysis of the symmetry between the resistive lines connecting the transistor active area with the pads.
Keywords :
MOSFET; elemental semiconductors; semiconductor device models; silicon-on-insulator; FinFET-type device; electrical measurement; junctionless MOSFET characterization; junctionless MOSFET fabrication; junctionless MOSFET model; junctionless SOI MOS device fabrication; resistive lines; sensor application; single-process sequence; transistor active area; Correlation; FinFETs; Logic gates; Silicon; Substrates; FinFET; PaDEOx; SOI; electrical measurements; junctionless MOSFET; parameter extraction;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Mixed Design of Integrated Circuits & Systems (MIXDES), 2014 Proceedings of the 21st International Conference
Conference_Location :
Lublin
Print_ISBN :
978-83-63578-03-9
Type :
conf
DOI :
10.1109/MIXDES.2014.6872220
Filename :
6872220
Link To Document :
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