• DocumentCode
    1777191
  • Title

    Conductance of graphene: Role of metal contact, charge puddles and differential gating

  • Author

    Sajjad, Redwan N. ; Tseng, Fan-Shuo ; Ghosh, Avik W.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Virginia, Charlottesville, VA, USA
  • fYear
    2014
  • fDate
    22-25 June 2014
  • Firstpage
    77
  • Lastpage
    78
  • Abstract
    We demonstrate how several experiments on graphene transport can be explained semi-quantitatively within a Non-Equilibrium Green´s Function (NEGF) formalism. The key features are controlled by-(i) the boundary potential established at a metal-graphene interface,(ii) charge puddles that help the conductivity in the ballistic limit and hurt in the diffusive limit and (iii) alignment of the local Dirac points in a multiply gated segment. Simulations reveal that at the ballistic limit, the conductance depends on the aspect ratio which controls tunneling from source to drain and across the metal-graphene interface. We show that the boundary potential VB at the interface together with Metal Induced Doping (MID) are critical to graphene transport-specifically, the maximum conductance achievable with a given metal contact, the electron-hole asymmetry (EHA) and the peak device resistance. The boundary potential is formed due to in-plane charge transfer from metal covered graphene to graphene on substrate [1] and may produce an additional smooth pn junction, typically ignored in existing models. In the experiments however, the contact resistance heavily depends on the fabrication procedure [2], varying from hundreds of Ω- μm to several thousands of Ω- μm [3]. A rigorous model of the performance limits of several contacts and change of carrier transport from ballistic to diffusive regime is lacking. We report the upper limit of the performance of various metal-graphene contacts and compare with the best available experimental values. To reach experimental dimensions, we use tight-binding real space calculations as well as the powerful KSF-RGFA approach (combination of K Space Formalism (KSF) and Recursive Green´s Function Algorithm (RGFA) [4]), which allows us to simulate devices as large as microns in size.
  • Keywords
    Green´s function methods; charge exchange; chemical interdiffusion; contact resistance; doping; electron-hole recombination; graphene; metal-insulator boundaries; tight-binding calculations; tunnelling; C; K space formalism; KSF-RGFA approach; MID; NEGF formalism; ballistic limit; ballistic regime; boundary potential; carrier transport; charge puddles; charge transfer; contact resistance; device resistance; differential gating; diffusive limit; diffusive regime; electron-hole asymmetry; graphene conductance; graphene transport; local Dirac points; metal-graphene contacts; metal-graphene interface; metal-induced doping; nonequilibrium Green´s function formalism; recursive Green´s function algorithm; tight-binding real space calculations; tunneling; Conductivity; Graphene; Impurities; Junctions; Logic gates; Metals; Resistance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference (DRC), 2014 72nd Annual
  • Conference_Location
    Santa Barbara, CA
  • Print_ISBN
    978-1-4799-5405-6
  • Type

    conf

  • DOI
    10.1109/DRC.2014.6872305
  • Filename
    6872305