Title :
Improved electron-beam lithography with C60 fullerene for InP membrane waveguides
Author :
Yuqing Jiao ; Pello, Josselin ; Longfei Shen ; Smalbrugge, B. ; Smit, Meint ; van der Tol, Jos
Author_Institution :
COBRA Res. Inst., Eindhoven Univ. of Technol., Eindhoven, Netherlands
Abstract :
We present a method to prepare a mixed resist material composed of a positive electron-beam resist (ZEP520A) and C60 fullerene. The method is modified from previous methods in literatures to achieve an optimized mixing. An improvement of the mixed material on the thermal resistance respect to the same structures fabricated with normal ZEP resist has been demonstrated by fabricating multimode interference couplers and coupling regions of micro-ring resonators. An improvement on the propagation loss of the InP membrane waveguides from 6.6 to 3.3 dB/cm using this mixed material is also shown.
Keywords :
III-V semiconductors; electron beam lithography; fullerenes; indium compounds; micro-optics; optical couplers; optical fabrication; optical losses; optical materials; optical resonators; optical waveguides; photoresists; thermal resistance; C; C60 fullerene; InP; InP membrane waveguides; ZEP520A; electron-beam lithography; microring resonator coupling regions; mixed resist material; multimode interference coupler fabrication; normal ZEP resist; optimized mixing; positive electron-beam resist; propagation loss; thermal resistance; Couplings; Indium phosphide; Loss measurement; Optical waveguides; Propagation losses; Resists;
Conference_Titel :
Indium Phosphide and Related Materials (IPRM), 26th International Conference on
Conference_Location :
Montpellier
DOI :
10.1109/ICIPRM.2014.6880546
