DocumentCode :
1786156
Title :
Spectroscopic analysis of leakage current of pre- and post-stressed sol-gel-based TiO2 and SiO2/TiO2 stack films
Author :
Omura, Y. ; Kondo, Yuta
Author_Institution :
ORDIST Kansai Univ., Suita, Japan
fYear :
2014
fDate :
7-9 July 2014
Firstpage :
65
Lastpage :
68
Abstract :
This paper investigates the trap property of pre-and post-stressed TiO2/SiO2 stacks by the spectroscopic analysis of the leakage current. It is suggested that transport is ruled by the space-charge-limited current controlled by negative-charged traps. Spectroscopic analysis of the current fluctuation demonstrates that after stress application the current path varies with the polarity of the top electrode; this suggests that there are at least two-different paths inside the degraded TiO2/SiO2 stack.
Keywords :
random-access storage; silicon compounds; sol-gel processing; titanium compounds; SiO2-TiO2; current fluctuation; current path; leakage current; negative-charged traps; post-stressed sol-gel-based stack films; pre-stressed sol-gel stack films; resistive RAM; space-charge-limited current; spectroscopic analysis; stress application; top electrode polarity; trap property; Electron traps; Films; Fluctuations; Leakage currents; MIM capacitors; Stress; Temperature dependence; constant-voltage stress; insulator film; resistive RAM; so/-gel; space-charge-limited current; trap;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Low Temperature Electronics (WOLTE), 2014 11th International Workshop on
Conference_Location :
Grenoble
Type :
conf
DOI :
10.1109/WOLTE.2014.6881027
Filename :
6881027
Link To Document :
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