FTIR research of protective PECVD coating for electro-optical devices

Author

Sidorov, Denis I. ; Mushinsky, Sergey S. ; Shevtsov, Denis I. ; Pervadchuk, Vladimir P.

Author_Institution

Perm Nat. Res. Polytech. Univ., Perm, Russia

fYear

2014

fDate

June 30 2014-July 4 2014

Firstpage

95

Lastpage

97

Abstract

The paper presents results of FTIR analysis of silicon organic thin films prepared by plasma enhanced chemical vapor deposition methods. The films were deposited from hexamethyldisilazane and oxygen mixture. Refractive index and deposition rates were obtained. Dependencies on plasma source power are presented. Possibility to prepare films with variable properties during deposition was demonstrated.

Keywords

Fourier transform spectra; infrared spectra; optical films; organic compounds; plasma CVD; plasma CVD coatings; protective coatings; refractive index; silicon compounds; thin films; FTIR; deposition rates; electro-optical devices; hexamethyldisilazane; oxygen mixture; plasma enhanced chemical vapor deposition; plasma source power; protective PECVD coating; refractive index; silicon organic thin films; Educational institutions; Films; Plasmas; Silicon; Spectroscopy; Substrates; FTIR; HMDSN; Mode spectroscopy; PECVD; Silicon organic thin films;

fLanguage

English

Publisher

ieee

Conference_Titel

Micro/Nanotechnologies and Electron Devices (EDM), 2014 15th International Conference of Young Specialists on

Conference_Location

Novosibirsk

ISSN

2325-4173

Print_ISBN

978-1-4799-4669-3

Type

conf

DOI

10.1109/EDM.2014.6882485

Filename

6882485