• DocumentCode
    1792620
  • Title

    Low temperature and low pressure bump bonding realized by single-micrometer Ag-nanoparticle bumps

  • Author

    Weixin Fu ; Kasahara, T. ; Okada, Atsushi ; Shoji, Shuji ; Shigetou, Akitsu ; Mizuno, Jun

  • Author_Institution
    Dept. of Nanosci. & Nanoengineering, Waseda Univ., Tokyo, Japan
  • fYear
    2014
  • fDate
    15-16 July 2014
  • Firstpage
    47
  • Lastpage
    47
  • Abstract
    A bonding method using single-micrometer bumps, which were formed by Ag nanoparticle, had been realized under low bonding temperature and low compressive stress. The bump diameter is 8 μm and the pitch is 16 μm. The bonding temperature was 250°C under compressive stress of about 41.4 MPa. A shear test was carried out and the strength of the bond could reach 5.89 MPa.
  • Keywords
    compressive strength; integrated circuit bonding; nanoparticles; shear strength; silver; three-dimensional integrated circuits; Ag; low bonding temperature; low compressive stress; low pressure bump bonding; shear test; single-micrometer Ag-nanoparticle bumps; size 8 mum; temperature 250 degC; Bonding; Compressive stress; Educational institutions; Plasma temperature; Silicon; Substrates; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Low Temperature Bonding for 3D Integration (LTB-3D), 2014 4th IEEE International Workshop on
  • Conference_Location
    Tokyo
  • Print_ISBN
    978-1-4799-5260-1
  • Type

    conf

  • DOI
    10.1109/LTB-3D.2014.6886186
  • Filename
    6886186