DocumentCode
1794434
Title
High performance 1.3µm InAs quantum dot lasers epitaxially grown on silicon
Author
Liu, Alan Y. ; Chong Zhang ; Snyder, Andrew ; Lubychev, Dimitri ; Fastenau, Joel M. ; Liu, Amy W. K. ; Gossard, Arthur C. ; Bowers, John E.
Author_Institution
Mater. Dept., Univ. of California Santa Barbara, Santa Barbara, CA, USA
fYear
2014
fDate
9-13 March 2014
Firstpage
1
Lastpage
3
Abstract
We demonstrate 1.3 μm InAs quantum dot lasers on silicon by molecular beam epitaxial growth with low thresholds (16 mA), high output power (>50 mW), high T0 (>200 K), and high temperature lasing (115 °C).
Keywords
III-V semiconductors; indium compounds; molecular beam epitaxial growth; quantum dot lasers; semiconductor epitaxial layers; semiconductor growth; silicon; InAs; Si; current 16 mA; high T0; high output power; high temperature lasing; low thresholds; molecular beam epitaxial growth; quantum dot lasers; temperature 115 degC; wavelength 1.3 mum; Gallium arsenide; Quantum dot lasers; Silicon; Substrates; Surface emitting lasers; Waveguide lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical Fiber Communications Conference and Exhibition (OFC), 2014
Conference_Location
San Francisco, CA
Print_ISBN
978-1-5575-2994-7
Type
conf
DOI
10.1364/OFC.2014.W4C.5
Filename
6887173
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