Large area full fill factor microlens arrays

Production of microlens arrays using the resist reflow technique has been extensively reported. These arrays have fill factors approaching 75% and in optical imaging systems the unlensed light introduces noise. N.T. Gordon et al. reported a sophisticated technique able to create full fill lens arrays. Davies and McCormick using optical lithography, proposed an alternative, less expensive method for photosculpting such full fill factor arrays. Large area microlens arrays when used for imaging require good spherical aberration compensation. A technique capable of generating non spherical forms is presented