Novel fabrication of glass microchip using amorphous silicon for comparison of channel surface properties on electrophoresis

Author

Kim, Min-Su ; Cho, Seung Il ; Lee, Kook-Nyung ; Kim, Yong-Kweon

Author_Institution

Sch. of Electr. Eng. & Comput. Sci., Seoul Nat. Univ., South Korea

Volume

2

fYear

2005

fDate

5-9 June 2005

Firstpage

1612

Abstract

We describe a new fabrication method for a glass microchip using amorphous silicon on the glass surface as an etch mask and a bonding interface for anodic bonding. We investigated the mobilities and bandwidths of electroosmotic flow (EOF) and analytes in microchip electrophoresis. Significant band broadening was observed in a microchip composed of a hybrid material (glass and silicon dioxide membrane) compared with a microchip of single material due to the nonuniformity of the surface charge density.

Keywords

amorphous semiconductors; electrophoresis; etching; glass; masks; microfluidics; silicon compounds; amorphous silicon; anodic bonding; bonding interface; channel surface properties; electroosmotic flow; etch mask; glass microchips; hybrid microchip; microchip electrophoresis; Amorphous silicon; Bandwidth; Bonding; Electrokinetics; Etching; Fabrication; Glass; Microchannel; Microfluidics; Silicon compounds;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on

Print_ISBN

0-7803-8994-8

Type

conf

DOI

10.1109/SENSOR.2005.1497396

Filename

1497396