DocumentCode :
1800694
Title :
Novel fabrication of glass microchip using amorphous silicon for comparison of channel surface properties on electrophoresis
Author :
Kim, Min-Su ; Cho, Seung Il ; Lee, Kook-Nyung ; Kim, Yong-Kweon
Author_Institution :
Sch. of Electr. Eng. & Comput. Sci., Seoul Nat. Univ., South Korea
Volume :
2
fYear :
2005
fDate :
5-9 June 2005
Firstpage :
1612
Abstract :
We describe a new fabrication method for a glass microchip using amorphous silicon on the glass surface as an etch mask and a bonding interface for anodic bonding. We investigated the mobilities and bandwidths of electroosmotic flow (EOF) and analytes in microchip electrophoresis. Significant band broadening was observed in a microchip composed of a hybrid material (glass and silicon dioxide membrane) compared with a microchip of single material due to the nonuniformity of the surface charge density.
Keywords :
amorphous semiconductors; electrophoresis; etching; glass; masks; microfluidics; silicon compounds; amorphous silicon; anodic bonding; bonding interface; channel surface properties; electroosmotic flow; etch mask; glass microchips; hybrid microchip; microchip electrophoresis; Amorphous silicon; Bandwidth; Bonding; Electrokinetics; Etching; Fabrication; Glass; Microchannel; Microfluidics; Silicon compounds;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on
Print_ISBN :
0-7803-8994-8
Type :
conf
DOI :
10.1109/SENSOR.2005.1497396
Filename :
1497396
Link To Document :
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