Title :
Hydrodynamic and analytical models for plasma immersion ion implantation with dielectric substrates
Author :
Yuanzhong Zhou ; Shu Qin ; Chung Chan
Author_Institution :
Dept. of Electr. & Comput. Eng., Northeastern Univ., Boston, MA, USA
Abstract :
Summary form only given. The characteristics of the plasma sheath and ion energy during plasma immersion ion implantation (PIII) process are very important for the optimum configuration design and process control. A hydrodynamic model and a quasistatical model have been established to describe PIII process for dielectric substrates.
Keywords :
dielectric materials; ion implantation; plasma applications; plasma sheaths; analytical models; dielectric substrates; hydrodynamic models; ion energy; optimum configuration design; plasma immersion ion implantation; plasma sheath; process control; quasistatical model; Analytical models; Dielectric substrates; Equations; Hydrodynamics; Plasma applications; Plasma immersion ion implantation; Plasma materials processing; Plasma measurements; Plasma sheaths; Plasma waves;
Conference_Titel :
Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
Conference_Location :
San Diego, CA, USA
Print_ISBN :
0-7803-3990-8
DOI :
10.1109/PLASMA.1997.604449
