Intense pulsed ion-beam ablation for material applications

Author

Jiang, Wei ; Suzuki, Takumi ; Yatsui, K.

Author_Institution

Nagaoka Univ. of Technol., Japan

fYear

2001

fDate

17-22 June 2001

Firstpage

368

Abstract

Summary form only given, as follows. The intense pulsed ion beam is used to generate high-density, high-temperature ablation plasma. This ablation plasma has potential applications in material development such as thin-film deposition and nanosize material synthesis. We studied the processes of ion-beam energy deposition and ablation plasma expansion by using the diagnostic techniques of calorimetry and high-speed photography. The results are used to investigate the ablation plasma characteristics that are very important issues in material applications.

Keywords

calorimetry; high-speed optical techniques; ion beam applications; ion beam effects; plasma deposition; plasma diagnostics; plasma materials processing; plasma production; calorimetry; diagnostic techniques; high-density high-temperature ablation plasma; high-speed photography; intense pulsed ion beam; intense pulsed ion-beam ablation; ion-beam energy deposition; material applications; nanosize material synthesis; thin-film deposition; Calorimetry; Ion beams; Nanostructured materials; Photography; Plasma applications; Plasma diagnostics; Plasma materials processing; Plasma properties; Pulse generation; Sputtering;

fLanguage

English

Publisher

ieee

Conference_Titel

Pulsed Power Plasma Science, 2001. IEEE Conference Record - Abstracts

Conference_Location

Las Vegas, NV, USA

Print_ISBN

0-7803-7141-0

Type

conf

DOI

10.1109/PPPS.2001.961078

Filename

961078