Title :
Intense pulsed ion-beam ablation for material applications
Author :
Jiang, Wei ; Suzuki, Takumi ; Yatsui, K.
Author_Institution :
Nagaoka Univ. of Technol., Japan
Abstract :
Summary form only given, as follows. The intense pulsed ion beam is used to generate high-density, high-temperature ablation plasma. This ablation plasma has potential applications in material development such as thin-film deposition and nanosize material synthesis. We studied the processes of ion-beam energy deposition and ablation plasma expansion by using the diagnostic techniques of calorimetry and high-speed photography. The results are used to investigate the ablation plasma characteristics that are very important issues in material applications.
Keywords :
calorimetry; high-speed optical techniques; ion beam applications; ion beam effects; plasma deposition; plasma diagnostics; plasma materials processing; plasma production; calorimetry; diagnostic techniques; high-density high-temperature ablation plasma; high-speed photography; intense pulsed ion beam; intense pulsed ion-beam ablation; ion-beam energy deposition; material applications; nanosize material synthesis; thin-film deposition; Calorimetry; Ion beams; Nanostructured materials; Photography; Plasma applications; Plasma diagnostics; Plasma materials processing; Plasma properties; Pulse generation; Sputtering;
Conference_Titel :
Pulsed Power Plasma Science, 2001. IEEE Conference Record - Abstracts
Conference_Location :
Las Vegas, NV, USA
Print_ISBN :
0-7803-7141-0
DOI :
10.1109/PPPS.2001.961078
