Combined vacuum ultraviolet and optical emission analysis of an inductively coupled plasma

Summary form only given, as follows. Identification of the most relevant species and its production channel are essential to both process optimization and the understanding of plasma processing mechanisms. Under electron impact, molecular and atomic active species provide rich emission spectra ranging from the optical to the infrared wavelength and in many transitional excitations of the ground state the wavelengths are in vacuum ultraviolet (VUV) range. We report a combined and simultaneous measurements of both VUV and optical emissions in an inductively coupled plasma. From the spectroscopic data, we then determine electron temperature as well as the relative change of number density of active species both in excited and ground states under different plasma conditions. In addition, a specially designed light detecting system is employed to obtain spatially resolved spectra in both VUV and optical wavelength ranges in the radial direction in an inductively coupled plasma reactor. Nitrogen, argon and helium are used and the pressure range is from 0.1 Pa to 100 Pa.