DocumentCode :
1802679
Title :
Combined vacuum ultraviolet and optical emission analysis of an inductively coupled plasma
Author :
Pu, Yi-Kang ; Guo, Z.-G. ; Kang, Z.-D.
Author_Institution :
Tsinghua Univ., Beijing, China
fYear :
2001
fDate :
17-22 June 2001
Firstpage :
381
Abstract :
Summary form only given, as follows. Identification of the most relevant species and its production channel are essential to both process optimization and the understanding of plasma processing mechanisms. Under electron impact, molecular and atomic active species provide rich emission spectra ranging from the optical to the infrared wavelength and in many transitional excitations of the ground state the wavelengths are in vacuum ultraviolet (VUV) range. We report a combined and simultaneous measurements of both VUV and optical emissions in an inductively coupled plasma. From the spectroscopic data, we then determine electron temperature as well as the relative change of number density of active species both in excited and ground states under different plasma conditions. In addition, a specially designed light detecting system is employed to obtain spatially resolved spectra in both VUV and optical wavelength ranges in the radial direction in an inductively coupled plasma reactor. Nitrogen, argon and helium are used and the pressure range is from 0.1 Pa to 100 Pa.
Keywords :
argon; excited states; ground states; helium; nitrogen; plasma collision processes; plasma density; plasma diagnostics; plasma temperature; 0.1 to 100 Pa; Ar; He; N/sub 2/; VUV emissions; VUV range; VUV wavelength ranges; active species; atomic active species; electron impact; electron temperature; emission spectra; excited states; ground state; ground states; inductively coupled plasma; inductively coupled plasma reactor; infrared wavelength; light detecting system; molecular active species; number density; optical emission analysis; optical emissions; optical wavelength; optical wavelength ranges; plasma conditions; plasma processing mechanisms; pressure range; process optimization; production channel; radial direction; spatially resolved spectra; spectroscopic data; transitional excitations; vacuum ultraviolet emission analysis; vacuum ultraviolet range; Atom optics; Electron optics; Optical coupling; Plasma density; Plasma measurements; Plasma temperature; Plasma waves; Production; Stationary state; Stimulated emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Pulsed Power Plasma Science, 2001. IEEE Conference Record - Abstracts
Conference_Location :
Las Vegas, NV, USA
Print_ISBN :
0-7803-7141-0
Type :
conf
DOI :
10.1109/PPPS.2001.961100
Filename :
961100
Link To Document :
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