DocumentCode
1803424
Title
A feedforward neural networks (FNN) used for semiconductor wafer fabrication parameters optimization
Author
Yongmei, Chen ; Xiangdong, Wang ; Shoujue, Wang ; Linchu, Shi
Author_Institution
Beijing, China
Volume
6
fYear
1999
fDate
36342
Firstpage
3922
Abstract
Semiconductor wafer fabrication process is a dynamic, very complex and multiphase system. The wafer performance is determined by so many factors in manufacturing process that it is very difficult to model the whole process with a statistical method. In this paper, an effective optimization strategy of the semiconductor manufacturing process is implemented. This method is based on a feedforward neural network (FNN), which uses a Gaussian function as the activation function of its hidden units and sigmoid as that of output unit. By training with samples collected from historical technological record, the static FNN model is built to fit the wafer fabrication process. Then some newer samples collected from the latest manufacturing lots are fed to retrain the network. During this retrain process, some “bad” or noisy samples are replaced by the new ones, a dynamic FNN model is built so that the trained network would fit the actual manufacturing process better and closely
Keywords
feedforward neural nets; integrated circuit manufacture; optimisation; transfer functions; FNN; Gaussian function; activation function; feedforward neural network; noisy samples; semiconductor manufacturing process; semiconductor wafer fabrication parameters optimization; Educational institutions; Etching; Fabrication; Feedforward neural networks; Manufacturing processes; Neural networks; Plasma applications; Predictive models; Semiconductor device modeling; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Neural Networks, 1999. IJCNN '99. International Joint Conference on
Conference_Location
Washington, DC
ISSN
1098-7576
Print_ISBN
0-7803-5529-6
Type
conf
DOI
10.1109/IJCNN.1999.830783
Filename
830783
Link To Document