Electron distribution function in e-beam generated KrF amplifier

Summary form only given, as follows. A model for electron deposition in Ar-Kr-F/sub 2/ mixture, based on solution of the electron Boltzmann equation, is presented. The model is relevant to an electron beam generated KrF amplifier at atmospheric pressure and aims to investigate the electron energy deposition at different input parameters. The energy deposition model includes elastic scattering, excitation to 12 excited states of both Ar and Kr, valence and inner shell ionization as well as attachment, dissociation, vibrational and electronic excitation and ionization of F/sub 2/ molecules. Calculations have been performed to determine the electron distribution function, energy per electron-ion pair and the individual excitation and ionization rates. The impact of the gas composition, beam power and beam energy on the electron distribution function and the branching ratios for energy deposition on various Ar and Kr levels have been investigated. It has been found that the inner shell ionization and production of Auger electrons is important and that the branching ratios for energy deposition depend on the gas composition and input power. An energy per electron-ion pair of 25 eV has been calculated, which in is good agreement with former results. The stopping standard powers can also be reproduced.