DocumentCode
1806205
Title
A patterning technique for superconducting MgB2 films
Author
Yang, Fashun ; Zhou, Zhangyu ; Ding, Zhao ; Fu, Xinghua
Author_Institution
Dept. of Electron., Guizhou Univ., Guiyang
Volume
2
fYear
2008
fDate
21-24 April 2008
Firstpage
595
Lastpage
596
Abstract
The precursor boron films were prepared by chemical vapor deposition by using diborane as the boron source, and patterned by using H2O2 solution as the etchant. The films then annealed in Mg vapor in a tantalum crucible. The patterned MgB2 films with high resolution has a transition temperature of 37 K and a critical current density of 1times106 A/cm2.
Keywords
boron; magnesium compounds; superconducting thin films; MgB2; boron source; chemical vapor deposition; diborane; patterning technique; precursor boron films; superconducting MgB2 films; tantalum crucible; Aluminum oxide; Annealing; Argon; Boron; Chemical vapor deposition; Magnesium compounds; Strips; Substrates; Superconducting films; Superconducting transition temperature; CVD; Magnesium diboride; lithography; patterning; superconducting films;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave and Millimeter Wave Technology, 2008. ICMMT 2008. International Conference on
Conference_Location
Nanjing
Print_ISBN
978-1-4244-1879-4
Electronic_ISBN
978-1-4244-1880-0
Type
conf
DOI
10.1109/ICMMT.2008.4540463
Filename
4540463
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