DocumentCode :
1807649
Title :
SKVIN-1 bench for studying of breakdown mechanisms of insulating gaps with short voltage pulses
Author :
Ivanovsky, A.V. ; Volkov, A.A. ; Volkova, T.I. ; Duday, P.V. ; Lysenko, V.P. ; Lukyanov, N.B. ; Soloviev, A.A. ; Spirov, G.M.
fYear :
2001
fDate :
17-22 June 2001
Firstpage :
485
Abstract :
Summary form only given, as follows. The appearance and block diagram of a SKVIN-1 bench for studying the breakdown mechanisms of air insulating gaps at voltage pulses effect with nanosecond rise fronts are presented. The bench makes it possible to perform investigations at voltage pulses of both positive and negative polarity with varying amplitude of 100-500 kV; rise time of 30-400 ns; and source resistance of 10-500 Ohm. The diagnostic base of the SKVIN-1 bench allows to measure voltage, pulsed current; record optical pattern in streak and frame registration regimes both on the pre-ionization stage and the main discharge in an unified time scale. Some investigation results of the discharge parameters in the air gap rod-plane both on the pre-ionization stage and the main discharge are presented. Comparison of the recorded experimental discharge parameters with the data of numerical simulation in the framework of the joint solution of Maxwell equations and air ionization kinetics in two-dimensional geometry is performed.
Keywords :
Maxwell equations; air gaps; discharges (electric); numerical analysis; plasma diagnostics; preionisation; 10 to 500 ohm; 100 to 500 kV; 30 to 400 ns; Maxwell equations; SKVIN-1 bench; air gap rod-plane; air insulating gaps; air ionization kinetics; block diagram; breakdown mechanisms; diagnostic base; discharge parameters; frame registration regimes; insulating gaps; main discharge; nanosecond rise fronts; negative polarity; numerical simulation; optical pattern; positive polarity; pre-ionization stage; rise time; short voltage pulses; source resistance; streak registration regimes; two-dimensional geometry; unified time scale; voltage pulses; Breakdown voltage; Current measurement; Electric breakdown; Electrical resistance measurement; Fault location; Insulation; Optical pulses; Pulse measurements; Time measurement; Voltage measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Pulsed Power Plasma Science, 2001. IEEE Conference Record - Abstracts
Conference_Location :
Las Vegas, NV, USA
Print_ISBN :
0-7803-7141-0
Type :
conf
DOI :
10.1109/PPPS.2001.961269
Filename :
961269
Link To Document :
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