DocumentCode :
1810866
Title :
Plasma cleaning of various electronic packaging materials to improve adhesion property
Author :
Paek, K.-H. ; Ju, W.-T. ; Kim, Young-Hun ; Seo, Ji-Hye ; Kim, Dong-Yeon ; Hwang, Y.-S. ; Choe, W.-H. ; Choi, J.-J.
Author_Institution :
Seoul Nat. Univ., South Korea
fYear :
2001
fDate :
17-22 June 2001
Firstpage :
555
Abstract :
Summary form only given, as follows. Advanced integrated circuit packaging processes require high bondability and reliability between various mating surfaces and a key factor affecting this requirements is the surface cleanliness. Contaminants degrading the adhesion property include organic or oxide layers and these impurities should be thoroughly removed before the bonding process. Plasma can be used for this purpose and has many potential advantages-reduction of processing waste, cleaner surface, controllability and a dry process, in comparison to chemical cleaning. A nonthermal plasma generated at atmospheric pressure has been used in cleaning a surface of wire bonding substrates and flip chip bumps widely used in todays packaging industry. The relation between the processing parameters (processing time, gas composition, additional UV exposure) and bonding characteristics has been investigated.
Keywords :
adhesion; integrated circuit packaging; plasma applications; reliability; substrates; surface cleaning; UV exposure; adhesion property; advanced integrated circuit packaging; atmospheric pressure; bondability; bonding characteristics; bonding process; chemical cleaning; cleaner surface; contaminants; controllability; dry process; electronic packaging materials; flip chip bumps; gas composition; impurities; mating surfaces; nonthermal plasma; organic layer; oxide layer; packaging industry; plasma cleaning; processing parameters; processing time; processing waste; reliability; surface cleanliness; wire bonding substrates; Atmospheric-pressure plasmas; Bonding; Cleaning; Electronics packaging; Integrated circuit packaging; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma properties; Surface contamination;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Pulsed Power Plasma Science, 2001. IEEE Conference Record - Abstracts
Conference_Location :
Las Vegas, NV, USA
Print_ISBN :
0-7803-7141-0
Type :
conf
DOI :
10.1109/PPPS.2001.961383
Filename :
961383
Link To Document :
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