• DocumentCode
    1810866
  • Title

    Plasma cleaning of various electronic packaging materials to improve adhesion property

  • Author

    Paek, K.-H. ; Ju, W.-T. ; Kim, Young-Hun ; Seo, Ji-Hye ; Kim, Dong-Yeon ; Hwang, Y.-S. ; Choe, W.-H. ; Choi, J.-J.

  • Author_Institution
    Seoul Nat. Univ., South Korea
  • fYear
    2001
  • fDate
    17-22 June 2001
  • Firstpage
    555
  • Abstract
    Summary form only given, as follows. Advanced integrated circuit packaging processes require high bondability and reliability between various mating surfaces and a key factor affecting this requirements is the surface cleanliness. Contaminants degrading the adhesion property include organic or oxide layers and these impurities should be thoroughly removed before the bonding process. Plasma can be used for this purpose and has many potential advantages-reduction of processing waste, cleaner surface, controllability and a dry process, in comparison to chemical cleaning. A nonthermal plasma generated at atmospheric pressure has been used in cleaning a surface of wire bonding substrates and flip chip bumps widely used in todays packaging industry. The relation between the processing parameters (processing time, gas composition, additional UV exposure) and bonding characteristics has been investigated.
  • Keywords
    adhesion; integrated circuit packaging; plasma applications; reliability; substrates; surface cleaning; UV exposure; adhesion property; advanced integrated circuit packaging; atmospheric pressure; bondability; bonding characteristics; bonding process; chemical cleaning; cleaner surface; contaminants; controllability; dry process; electronic packaging materials; flip chip bumps; gas composition; impurities; mating surfaces; nonthermal plasma; organic layer; oxide layer; packaging industry; plasma cleaning; processing parameters; processing time; processing waste; reliability; surface cleanliness; wire bonding substrates; Atmospheric-pressure plasmas; Bonding; Cleaning; Electronics packaging; Integrated circuit packaging; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma properties; Surface contamination;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Pulsed Power Plasma Science, 2001. IEEE Conference Record - Abstracts
  • Conference_Location
    Las Vegas, NV, USA
  • Print_ISBN
    0-7803-7141-0
  • Type

    conf

  • DOI
    10.1109/PPPS.2001.961383
  • Filename
    961383