• DocumentCode
    1811373
  • Title

    Twin generation in zinc-blende type III–V compound semiconductors: New insights from an InP case study

  • Author

    Neubert, M. ; Kwasniewski, A. ; Fornari, R.

  • Author_Institution
    Inst. fuer Kristallzuechtung, Berlin
  • fYear
    2008
  • fDate
    25-29 May 2008
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    The type of twinning in zincblende-or sphalerite-type III-V compound semiconductors is well known. However, its detailed formation mechanism, although intensively studied in the eighties and nineties, is not entirely understood. In addition to a lot of empirical observations, there is a theoretical approach, published in 1995 [1] and improved in 1998 [2]. The latter predicts a correlation between crystal slope angle a and twin generation frequency. However, a critical overview of our own experimental results on GaAs and InP, grown by LEC (Liquid Encapsulated Czochralski) and VCz (Vapour Pressure controlled Czochralski) techniques, leads to no unambiguous relation between twin formation and crystal slope angle. This paper gives a comparison between experimental results and the above mentioned theory, revealing that twinning is more correlated to dynamical effects like oscillations of growth rate, i.e. noise of the system.
  • Keywords
    III-V semiconductors; crystal growth from melt; gallium arsenide; indium compounds; semiconductor growth; twinning; GaAs; InP; crystal slope angle; growth rate oscillations; liquid encapsulated Czochralski technique; twinning; vapour pressure controlled Czochralski techniques; zinc-blende type III-V compound semiconductors; Crystals; Fluctuations; Frequency; Gallium arsenide; III-V semiconductor materials; Indium phosphide; Pressure control; Semiconductor device noise; Statistical analysis; Temperature; Czochralski; III–V; InP; compound semiconductors; twin formation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 2008. IPRM 2008. 20th International Conference on
  • Conference_Location
    Versailles
  • ISSN
    1092-8669
  • Print_ISBN
    978-1-4244-2258-6
  • Electronic_ISBN
    1092-8669
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2008.4702900
  • Filename
    4702900