DocumentCode :
1811737
Title :
Emitter size effects and scalability of GaInP/GaAsSb/InP DHBTS
Author :
Liu, H.G. ; Ostinelli, O. ; Zeng, YP ; Bolognesi, C.R.
Author_Institution :
Lab. for Field Theor. & Microwave Electron. (IfH), ETH Zurich, Zurich
fYear :
2008
fDate :
25-29 May 2008
Firstpage :
1
Lastpage :
3
Abstract :
The static gain characteristics of NpN InP/GaAsxSb1-x/InP double heterojunction bipolar transistors (DHBTs) were studied as a function of the base arsenic (As) mole fraction x. Compared to the devices with a lattice-matched base (x=0.51), a current gain improvement arising principally from a base current reduction is observed in DHBTs having higher As- base mole fractions (and consequently, with a reduced type-II conduction band discontinuity DeltaEC at the emitter-base junction). Both the surface periphery and the intrinsic recombination currents decrease markedly as the base arsenic concentration increases. The present work therefore unambiguously demonstrates that the emitter type-II conduction band discontinuity between the InP emitter and the GaAsxSb1-x base enhances the undesirable emitter-size effects (ESEs) and increases intrinsic recombination currents directly under the emitter contact.
Keywords :
III-V semiconductors; gallium arsenide; gallium compounds; heterojunction bipolar transistors; indium compounds; semiconductor device testing; DHBT; GaInP-GaAsxSb1-x-InP; double heteroj bipolar transistors; emitter size effects; intrinsic recombination currents; scalability; static gain characteristics; surface periphery; type-II conduction band discontinuity; Chemical elements; Doping; Double heterojunction bipolar transistors; Electrons; Indium phosphide; Inductors; Laboratories; Microwave devices; Microwave theory and techniques; Scalability; Arsenic mole fraction; Band discontinuities; Current gain; Double heterojunction bipolar transistors (DHBTs); Emitter size effects; GaAsSb; Recombination current;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 2008. IPRM 2008. 20th International Conference on
Conference_Location :
Versailles
ISSN :
1092-8669
Print_ISBN :
978-1-4244-2258-6
Electronic_ISBN :
1092-8669
Type :
conf
DOI :
10.1109/ICIPRM.2008.4702914
Filename :
4702914
Link To Document :
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