• DocumentCode
    1811737
  • Title

    Emitter size effects and scalability of GaInP/GaAsSb/InP DHBTS

  • Author

    Liu, H.G. ; Ostinelli, O. ; Zeng, YP ; Bolognesi, C.R.

  • Author_Institution
    Lab. for Field Theor. & Microwave Electron. (IfH), ETH Zurich, Zurich
  • fYear
    2008
  • fDate
    25-29 May 2008
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    The static gain characteristics of NpN InP/GaAsxSb1-x/InP double heterojunction bipolar transistors (DHBTs) were studied as a function of the base arsenic (As) mole fraction x. Compared to the devices with a lattice-matched base (x=0.51), a current gain improvement arising principally from a base current reduction is observed in DHBTs having higher As- base mole fractions (and consequently, with a reduced type-II conduction band discontinuity DeltaEC at the emitter-base junction). Both the surface periphery and the intrinsic recombination currents decrease markedly as the base arsenic concentration increases. The present work therefore unambiguously demonstrates that the emitter type-II conduction band discontinuity between the InP emitter and the GaAsxSb1-x base enhances the undesirable emitter-size effects (ESEs) and increases intrinsic recombination currents directly under the emitter contact.
  • Keywords
    III-V semiconductors; gallium arsenide; gallium compounds; heterojunction bipolar transistors; indium compounds; semiconductor device testing; DHBT; GaInP-GaAsxSb1-x-InP; double heteroj bipolar transistors; emitter size effects; intrinsic recombination currents; scalability; static gain characteristics; surface periphery; type-II conduction band discontinuity; Chemical elements; Doping; Double heterojunction bipolar transistors; Electrons; Indium phosphide; Inductors; Laboratories; Microwave devices; Microwave theory and techniques; Scalability; Arsenic mole fraction; Band discontinuities; Current gain; Double heterojunction bipolar transistors (DHBTs); Emitter size effects; GaAsSb; Recombination current;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 2008. IPRM 2008. 20th International Conference on
  • Conference_Location
    Versailles
  • ISSN
    1092-8669
  • Print_ISBN
    978-1-4244-2258-6
  • Electronic_ISBN
    1092-8669
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2008.4702914
  • Filename
    4702914