• DocumentCode
    181259
  • Title

    A novel Trench Fast Recovery Diode with injection control

  • Author

    Padmanabhan, K. ; Jun Hu ; Lei Zhang ; Bobde, Madhur ; Lingpeng Guan ; Yilmaz, Hamza ; Jongoh Kim

  • Author_Institution
    Alpha & Omega Semicond., Sunnyvale, CA, USA
  • fYear
    2014
  • fDate
    15-19 June 2014
  • Firstpage
    23
  • Lastpage
    26
  • Abstract
    A novel Trench Fast Recovery Diode (FRD) structure with injection control is proposed in this paper. The proposed structure achieves improved carrier profile without the need for excess lifetime control. This substantially improves the device performance, especially at extreme temperatures (-40 °C to 175 °C). The device maintains low leakage at high temperatures, and its Qrr and Irm do not degrade as is the usual case in heavily electron radiated devices. A 1600 diode using this structure is proposed in this paper, with a low Vf and good reverse recovery properties. The experimental results show that the structure maintains its performance at high temperatures.
  • Keywords
    charge injection; semiconductor device models; semiconductor diodes; FRD structure; Irm; Qrr; carrier profile; heavily electron radiated devices; injection control; reverse recovery properties; temperature -40 C to 175 C; trench fast recovery diode structure; Erbium; Performance evaluation; Semiconductor diodes; Silicon; Temperature; Temperature control; Temperature measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices & IC's (ISPSD), 2014 IEEE 26th International Symposium on
  • Conference_Location
    Waikoloa, HI
  • ISSN
    1943-653X
  • Print_ISBN
    978-1-4799-2917-7
  • Type

    conf

  • DOI
    10.1109/ISPSD.2014.6855966
  • Filename
    6855966