DocumentCode
181259
Title
A novel Trench Fast Recovery Diode with injection control
Author
Padmanabhan, K. ; Jun Hu ; Lei Zhang ; Bobde, Madhur ; Lingpeng Guan ; Yilmaz, Hamza ; Jongoh Kim
Author_Institution
Alpha & Omega Semicond., Sunnyvale, CA, USA
fYear
2014
fDate
15-19 June 2014
Firstpage
23
Lastpage
26
Abstract
A novel Trench Fast Recovery Diode (FRD) structure with injection control is proposed in this paper. The proposed structure achieves improved carrier profile without the need for excess lifetime control. This substantially improves the device performance, especially at extreme temperatures (-40 °C to 175 °C). The device maintains low leakage at high temperatures, and its Qrr and Irm do not degrade as is the usual case in heavily electron radiated devices. A 1600 diode using this structure is proposed in this paper, with a low Vf and good reverse recovery properties. The experimental results show that the structure maintains its performance at high temperatures.
Keywords
charge injection; semiconductor device models; semiconductor diodes; FRD structure; Irm; Qrr; carrier profile; heavily electron radiated devices; injection control; reverse recovery properties; temperature -40 C to 175 C; trench fast recovery diode structure; Erbium; Performance evaluation; Semiconductor diodes; Silicon; Temperature; Temperature control; Temperature measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Semiconductor Devices & IC's (ISPSD), 2014 IEEE 26th International Symposium on
Conference_Location
Waikoloa, HI
ISSN
1943-653X
Print_ISBN
978-1-4799-2917-7
Type
conf
DOI
10.1109/ISPSD.2014.6855966
Filename
6855966
Link To Document