DocumentCode
1812917
Title
Channel noise in InGaAs/InP composite channel high electron mobility transistors (HEMTs)
Author
Wang, Hong ; Liu, Yuwei
Author_Institution
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore
fYear
2008
fDate
25-29 May 2008
Firstpage
1
Lastpage
3
Abstract
High frequency channel noise in InP HEMTs with an InGaAs/InP composite channel has been characterized and analyzed to gain a better understanding on the high frequency noise originating from a more complicated channel structure. The channel noise in the composite channel HEMT shows different drain voltage dependence as compared to the conventional HEMT using a single InGaAs layer as the channel. A reduction of the channel noise at high drain voltage is observed in composite channel. This can be attributed to the suppression of the frequency dependent channel noise component, which is related to the impact ionization in the narrow bandgap InGaAs channel, due to the carrier transfer from InGaAs channel to InP subchannel at high Vd.
Keywords
III-V semiconductors; composite materials; gallium arsenide; high electron mobility transistors; impact ionisation; indium compounds; narrow band gap semiconductors; semiconductor device noise; HEMT; InGaAs-InP; carrier transfer; drain voltage; high electron mobility transistor; high frequency channel noise; impact ionization; narrow bandgap channel; semiconductor composite channel; Frequency dependence; HEMTs; Impact ionization; Indium gallium arsenide; Indium phosphide; MODFETs; Noise measurement; Noise reduction; Photonic band gap; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 2008. IPRM 2008. 20th International Conference on
Conference_Location
Versailles
ISSN
1092-8669
Print_ISBN
978-1-4244-2258-6
Electronic_ISBN
1092-8669
Type
conf
DOI
10.1109/ICIPRM.2008.4702957
Filename
4702957
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