Title :
Channel noise in InGaAs/InP composite channel high electron mobility transistors (HEMTs)
Author :
Wang, Hong ; Liu, Yuwei
Author_Institution :
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore
Abstract :
High frequency channel noise in InP HEMTs with an InGaAs/InP composite channel has been characterized and analyzed to gain a better understanding on the high frequency noise originating from a more complicated channel structure. The channel noise in the composite channel HEMT shows different drain voltage dependence as compared to the conventional HEMT using a single InGaAs layer as the channel. A reduction of the channel noise at high drain voltage is observed in composite channel. This can be attributed to the suppression of the frequency dependent channel noise component, which is related to the impact ionization in the narrow bandgap InGaAs channel, due to the carrier transfer from InGaAs channel to InP subchannel at high Vd.
Keywords :
III-V semiconductors; composite materials; gallium arsenide; high electron mobility transistors; impact ionisation; indium compounds; narrow band gap semiconductors; semiconductor device noise; HEMT; InGaAs-InP; carrier transfer; drain voltage; high electron mobility transistor; high frequency channel noise; impact ionization; narrow bandgap channel; semiconductor composite channel; Frequency dependence; HEMTs; Impact ionization; Indium gallium arsenide; Indium phosphide; MODFETs; Noise measurement; Noise reduction; Photonic band gap; Voltage;
Conference_Titel :
Indium Phosphide and Related Materials, 2008. IPRM 2008. 20th International Conference on
Conference_Location :
Versailles
Print_ISBN :
978-1-4244-2258-6
Electronic_ISBN :
1092-8669
DOI :
10.1109/ICIPRM.2008.4702957