Title :
X-ray emission from PF-1000 plasma-focus device admixtured with argon
Author :
Scholz, M. ; Borowiecki, M. ; Karpinski, L. ; Miklaszewski, R. ; Stepniewski, W. ; Sadowski, M. ; Szydlowski, A. ; Romanova, V.M. ; Pikuz, S.A. ; Faenov, T.Ya.
Author_Institution :
Inst. of Plasma Phys. & Laser Microfusion, Warsaw, Poland
Abstract :
Summary form only given. A new PF 1000 Mather-type plasma focus device with a 1.2 MJ capacitor bank, charging voltage U=45 kV, short circuit current I=15 MA, is now operated at IPPLM. The series of experiments with a hydrogen-argon mixture was performed within the energy range 250-450 kJ. The partial argon pressure was up to 20%. The hard and soft X-ray radiation was registered by means of scintillation probes, pinhole cameras and spectrometer equipped with a spherical crystal. The plasma current sheath dynamics was studied with streak cameras. To measure a discharge current a Rogowski coil and miniature magnetic probes were used.
Keywords :
X-ray production; argon; hydrogen; plasma diagnostics; plasma focus; plasma probes; plasma sheaths; plasma temperature; 1.2 MJ; 15 mA; 250 to 450 kJ; 45 kV; H/sub 2/-Ar; Mather-type plasma focus device; PF-1000 plasma-focus device; Rogowski coil; X-ray emission; capacitor bank; charging voltage; discharge current; energy range; hard X-ray radiation; miniature magnetic probes; pinhole cameras; plasma current sheath dynamics; scintillation probes; short circuit current; soft X-ray radiation; spectrometer; spherical crystal; streak cameras; Argon; Cameras; Capacitors; Plasma devices; Plasma measurements; Plasma x-ray sources; Probes; Short circuit currents; Spectroscopy; Voltage;
Conference_Titel :
Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
Conference_Location :
San Diego, CA, USA
Print_ISBN :
0-7803-3990-8
DOI :
10.1109/PLASMA.1997.604509
