DocumentCode
1813454
Title
Improved optical confinement in 1.55 μm InAs/GaInAsP quantum dot lasers grown by MOVPE
Author
Franke, D. ; Harde, P. ; Kreissl, J. ; Moehrle, M. ; Rehbein, W. ; Kuenzel, H. ; Pohl, U.W. ; Bimberg, D.
Author_Institution
Heinrich-Hertz-Inst., Fraunhofer Inst. for Telecommun., Berlin
fYear
2008
fDate
25-29 May 2008
Firstpage
1
Lastpage
4
Abstract
MOVPE-grown InAs quantum dots (QDs) implemented as active layers in 1.55 mum emitting InGaAsP/InP broad-area laser devices show improved characteristics with respect to previous MOVPE-based lasers and are now competitive with their MBE-grown counterparts. On the other hand, short devices exhibit markedly higher thresholds than quantum well lasers with an identical number of periods due to a low optical confinement. Increasing the QD density, the number of stacked QD layers and reducing the QD layer spacing is applied to improve the optical confinement and hence the laser characteristics. Increase of the number of stacked layers is demonstrated to result in a substantial improvement of the optimum length, while reduction of the spacer thickness was not found to influence device behaviour. Based on the described results laterally single mode buried heterostructure type lasers and semiconductor optical amplifiers were fabricated.
Keywords
MOCVD; gallium arsenide; indium compounds; quantum dot lasers; semiconductor optical amplifiers; vapour phase epitaxial growth; InAs-GaInAsP; InGaAsP-InP; MOVPE-based lasers; broad-area laser devices; layer spacing; optical confinement; quantum dot lasers; quantum well lasers; semiconductor optical amplifiers; single mode buried heterostructure type lasers; wavelength 1.55 mum; Epitaxial growth; Epitaxial layers; Indium phosphide; Laser modes; Optical devices; Quantum dot lasers; Quantum well lasers; Semiconductor lasers; Semiconductor optical amplifiers; Stimulated emission; 1.55 μm lasers; MOVPE; Nanostructures; quantum dots;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 2008. IPRM 2008. 20th International Conference on
Conference_Location
Versailles
ISSN
1092-8669
Print_ISBN
978-1-4244-2258-6
Electronic_ISBN
1092-8669
Type
conf
DOI
10.1109/ICIPRM.2008.4702972
Filename
4702972
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