Title :
Improved optical confinement in 1.55 μm InAs/GaInAsP quantum dot lasers grown by MOVPE
Author :
Franke, D. ; Harde, P. ; Kreissl, J. ; Moehrle, M. ; Rehbein, W. ; Kuenzel, H. ; Pohl, U.W. ; Bimberg, D.
Author_Institution :
Heinrich-Hertz-Inst., Fraunhofer Inst. for Telecommun., Berlin
Abstract :
MOVPE-grown InAs quantum dots (QDs) implemented as active layers in 1.55 mum emitting InGaAsP/InP broad-area laser devices show improved characteristics with respect to previous MOVPE-based lasers and are now competitive with their MBE-grown counterparts. On the other hand, short devices exhibit markedly higher thresholds than quantum well lasers with an identical number of periods due to a low optical confinement. Increasing the QD density, the number of stacked QD layers and reducing the QD layer spacing is applied to improve the optical confinement and hence the laser characteristics. Increase of the number of stacked layers is demonstrated to result in a substantial improvement of the optimum length, while reduction of the spacer thickness was not found to influence device behaviour. Based on the described results laterally single mode buried heterostructure type lasers and semiconductor optical amplifiers were fabricated.
Keywords :
MOCVD; gallium arsenide; indium compounds; quantum dot lasers; semiconductor optical amplifiers; vapour phase epitaxial growth; InAs-GaInAsP; InGaAsP-InP; MOVPE-based lasers; broad-area laser devices; layer spacing; optical confinement; quantum dot lasers; quantum well lasers; semiconductor optical amplifiers; single mode buried heterostructure type lasers; wavelength 1.55 mum; Epitaxial growth; Epitaxial layers; Indium phosphide; Laser modes; Optical devices; Quantum dot lasers; Quantum well lasers; Semiconductor lasers; Semiconductor optical amplifiers; Stimulated emission; 1.55 μm lasers; MOVPE; Nanostructures; quantum dots;
Conference_Titel :
Indium Phosphide and Related Materials, 2008. IPRM 2008. 20th International Conference on
Conference_Location :
Versailles
Print_ISBN :
978-1-4244-2258-6
Electronic_ISBN :
1092-8669
DOI :
10.1109/ICIPRM.2008.4702972