• DocumentCode
    1813454
  • Title

    Improved optical confinement in 1.55 μm InAs/GaInAsP quantum dot lasers grown by MOVPE

  • Author

    Franke, D. ; Harde, P. ; Kreissl, J. ; Moehrle, M. ; Rehbein, W. ; Kuenzel, H. ; Pohl, U.W. ; Bimberg, D.

  • Author_Institution
    Heinrich-Hertz-Inst., Fraunhofer Inst. for Telecommun., Berlin
  • fYear
    2008
  • fDate
    25-29 May 2008
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    MOVPE-grown InAs quantum dots (QDs) implemented as active layers in 1.55 mum emitting InGaAsP/InP broad-area laser devices show improved characteristics with respect to previous MOVPE-based lasers and are now competitive with their MBE-grown counterparts. On the other hand, short devices exhibit markedly higher thresholds than quantum well lasers with an identical number of periods due to a low optical confinement. Increasing the QD density, the number of stacked QD layers and reducing the QD layer spacing is applied to improve the optical confinement and hence the laser characteristics. Increase of the number of stacked layers is demonstrated to result in a substantial improvement of the optimum length, while reduction of the spacer thickness was not found to influence device behaviour. Based on the described results laterally single mode buried heterostructure type lasers and semiconductor optical amplifiers were fabricated.
  • Keywords
    MOCVD; gallium arsenide; indium compounds; quantum dot lasers; semiconductor optical amplifiers; vapour phase epitaxial growth; InAs-GaInAsP; InGaAsP-InP; MOVPE-based lasers; broad-area laser devices; layer spacing; optical confinement; quantum dot lasers; quantum well lasers; semiconductor optical amplifiers; single mode buried heterostructure type lasers; wavelength 1.55 mum; Epitaxial growth; Epitaxial layers; Indium phosphide; Laser modes; Optical devices; Quantum dot lasers; Quantum well lasers; Semiconductor lasers; Semiconductor optical amplifiers; Stimulated emission; 1.55 μm lasers; MOVPE; Nanostructures; quantum dots;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 2008. IPRM 2008. 20th International Conference on
  • Conference_Location
    Versailles
  • ISSN
    1092-8669
  • Print_ISBN
    978-1-4244-2258-6
  • Electronic_ISBN
    1092-8669
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2008.4702972
  • Filename
    4702972