DocumentCode :
181371
Title :
One-chip operation of GaN-based P-channel and N-channel heterojunction field effect transistors
Author :
Nakajima, Akitoshi ; Nishizawa, Sin-ichi ; Ohashi, H. ; Yonezawa, Hikaru ; Tsutsui, K. ; Kakushima, K. ; Wakabayashi, H. ; Iwai, Hisato
Author_Institution :
Energy Technol. Res. Inst., AIST, Tsukuba, Japan
fYear :
2014
fDate :
15-19 June 2014
Firstpage :
241
Lastpage :
244
Abstract :
Monolithic operation of GaN-based P-channel (Pch) and N-channel (Nch) heterojunction field effect transistors (HFETs) are demonstrated for the first time. The Pch and Nch HFETs were fabricated on a polarization junction platform with polarization induced 2D hole gas (2DHG) and 2D electron gas (2DEG). Because of temperature independent densities of the 2DHG and 2DEG, the HFETs can be operated in wide temperature range. Based on a measured 2DHG mobility, footprints of low-voltage Pch HFETs for gate drive applications were estimated by device simulation.
Keywords :
III-V semiconductors; field effect transistors; gallium compounds; wide band gap semiconductors; 2D electron gas; 2D hole gas; 2DEG; 2DHG; GaN; device simulation; gallium nitride Nch HFET; gallium nitride Pch HFET; gallium nitride-based N-channel heterojunction field effect transistors; gallium nitride-based P-channel heterojunction field effect transistors; gate drive application; low-voltage Pch HFET; monolithic operation; one-chip operation; polarization junction platform; temperature density; Electrodes; Gallium nitride; HEMTs; Logic gates; MODFETs; Temperature measurement; Two dimensional hole gas;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices & IC's (ISPSD), 2014 IEEE 26th International Symposium on
Conference_Location :
Waikoloa, HI
ISSN :
1943-653X
Print_ISBN :
978-1-4799-2917-7
Type :
conf
DOI :
10.1109/ISPSD.2014.6856021
Filename :
6856021
Link To Document :
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