DocumentCode
1813749
Title
High quality Inx Ga1−x As (x: 0.1– 0.13) platy crystal growth for substrates of 1.3μm laser diodes
Author
Kinoshita, Keizo ; Ueda, Toshitsugu ; Yoda, S. ; Arai, Manabu ; Kawaguchi, Yuki ; Kondo, Yuta ; Aoki, Hidetaka ; Hosokawa, T. ; Yamamoto, Seiichi
Author_Institution
Inst. of Space & Astronaut. Sci., Japan Aerosp. Exploration Agency, Tsukuba
fYear
2008
fDate
25-29 May 2008
Firstpage
1
Lastpage
4
Abstract
We have prepared homogeneous ternary InxGa1-xAs (x: 0.1 - 0.13) platy single crystals for 1.3 mum laser diode substrates by a novel bulk crystal growth technique named the TLZ (traveling liquidus-zone) method. We further improved the crystal quality by optimizing growth conditions and InxGa1-xAs (x: 0.1 - 0.13) single crystals having high quality area larger than 10 times30 mm2 were reproducibly grown.
Keywords
III-V semiconductors; crystal growth; gallium arsenide; indium compounds; semiconductor lasers; InGaAs; bulk crystal growth; homogeneous ternary crystals; laser diode substrates; platy crystal growth; traveling liquidus-zone method; wavelength 1.3 mum; Chemical lasers; Crystallization; Diode lasers; Fluctuations; Furnaces; Gallium arsenide; Optical surface waves; Photonic crystals; Stability; Temperature control; a new growth method; bulk crystal growth; substrates for laser diodes; ternary;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 2008. IPRM 2008. 20th International Conference on
Conference_Location
Versailles
ISSN
1092-8669
Print_ISBN
978-1-4244-2258-6
Electronic_ISBN
1092-8669
Type
conf
DOI
10.1109/ICIPRM.2008.4702984
Filename
4702984
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