DocumentCode :
1813977
Title :
Temperature dependence of GaSb overgrowth of tungsten on GaSb (001) substrates using MOVPE
Author :
Astromskas, Gvidas ; Jeppsson, Mattias ; Caroff, Philippe ; Wernersson, Lars-Erik
Author_Institution :
Dept. of Solid State Phys., Lund Univ., Lund
fYear :
2008
fDate :
25-29 May 2008
Firstpage :
1
Lastpage :
4
Abstract :
We demonstrate GaSb overgrowth over tungsten patterns and that selective area epitaxy is achievable in the W/GaSb system. By controlling the facet growth at low temperatures, it is possible to embed a metal grating in a thin layer.
Keywords :
III-V semiconductors; MOCVD; gallium compounds; semiconductor epitaxial layers; semiconductor growth; tungsten; vapour phase epitaxial growth; GaSb; GaSb(001) substrate; MOVPE; W-GaSb; overgrowth mechanism; selective area epitaxy; tungsten pattern; Cleaning; Epitaxial growth; Epitaxial layers; Inductors; Plasma applications; Plasma temperature; Resists; Substrates; Temperature dependence; Tungsten; GaSb; SAE; lateral growth; overgrowth; tungsten;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 2008. IPRM 2008. 20th International Conference on
Conference_Location :
Versailles
ISSN :
1092-8669
Print_ISBN :
978-1-4244-2258-6
Electronic_ISBN :
1092-8669
Type :
conf
DOI :
10.1109/ICIPRM.2008.4702990
Filename :
4702990
Link To Document :
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