Design and implementation of a prototype hybrid simulation environment

A prototype coupling a process simulator, like SUPREM4, to external process and equipment models, such as Advanced Vacuum Processors (AVPs), has been investigated and implemented. A MOS transistor was simulated using the hybrid simulation prototype. A combination of process simulators and AVP equipment models were used in the simulations. The modified process flow utilizes process simulators like SUPREM4 and SAMPLE, together with AVP equipment models for plasma-assisted deposition and etch of polysilicon. It is concluded that the prototype demonstrates the feasibility of a mixed equipment model-process simulator environment