Title :
22 kV, 1 cm2, 4H-SiC n-IGBTs with improved conductivity modulation
Author :
Brunt, Edward V. ; Cheng, Lin ; O´Loughlin, M. ; Capell, Craig ; Jonas, C. ; Lam, Kin-Man ; Richmond, Jim ; Pala, Vipindas ; Ryu, Sang-Burm ; Allen, Scott T. ; Burk, A.A. ; Palmour, John W. ; Scozzie, Charles
Author_Institution :
Cree, Inc., Durham, NC, USA
Abstract :
In this paper, we report our recently developed large area 4H-SiC n-IGBTs that have a chip size of 1 cm2 and an active conducting area of 0.37 cm2. A blocking voltage of 22.6 kV has been demonstrated with a leakage current of 9 μA at a gate bias of 0 V at room-temperature. This is the highest breakdown voltage of a single MOS-controlled semiconductor switch reported to date. To improve the conductivity modulation and lower the conduction losses during the on-state, a thermal oxidation process was applied to enhance the carrier lifetime prior to the device fabrication. Compared to the devices that did not receive this lifetime enhancement process, the lifetime enhanced devices displayed nearly 1 V lower forward voltage drop with little increase in switching energy and no degradation of static blocking characteristics. A specific differential on-resistance of 55 mΩ-cm2 at 20 A and 125 °C was achieved, suggesting that bipolar power devices with thick drift regions can benefit from further enhancement of the ambipolar carrier lifetime.
Keywords :
carrier lifetime; field effect transistor switches; leakage currents; power semiconductor switches; semiconductor device breakdown; silicon compounds; wide band gap semiconductors; H-SiC; ambipolar carrier lifetime enhancement; bipolar power devices; breakdown voltage; conduction losses; current 20 A; current 9 muA; device fabrication; forward voltage drop; improved conductivity modulation; leakage current; lifetime enhanced devices; lifetime enhancement process; n-IGBTs; single MOS-controlled semiconductor switch; static blocking characteristics; switching energy; temperature 125 degC; temperature 293 K to 298 K; thermal oxidation process; thick drift regions; voltage 0 V; voltage 22 kV; voltage 22.6 kV; Current density; Insulated gate bipolar transistors; Oxidation; Silicon carbide; Switches; Temperature; Temperature measurement;
Conference_Titel :
Power Semiconductor Devices & IC's (ISPSD), 2014 IEEE 26th International Symposium on
Conference_Location :
Waikoloa, HI
Print_ISBN :
978-1-4799-2917-7
DOI :
10.1109/ISPSD.2014.6856050