• DocumentCode
    1814398
  • Title

    MBE growth of InP-HBT structures on Ge-on-insulator/Si substrates by MBE

  • Author

    Lubyshev, D. ; Fastenau, M. ; Wu, Y. ; Liu, W.K. ; Urteaga, M. ; Ha, W. ; Bergman, J. ; Brar, B. ; Bulsara, M.T. ; Fitzgerald, E.A. ; Hoke, W.E. ; Laroche, J.R. ; Herrick, K.J. ; Kazior, T.E.

  • Author_Institution
    IQE Inc., Bethlehem, PA
  • fYear
    2008
  • fDate
    25-29 May 2008
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    MBE growth of InP-based HBTs on GeOI/Si substrates is described. A GaAs buffer is nucleated on the GeOI; then a graded InAlAs metamorphic buffer transitions the lattice constant to InP. TEM shows minimal anti-phase boundaries and limited dislocations propagating into the device layers. Large area DC parameters are similar to LM HBTs grown on InP. Small area devices exhibit peak current gain cutoff frequency (ft) of 170 GHz at 2 mA/mum2 nominal collector current density. Initial work involving selective epitaxial growth on patterned Ge substrates for future integration is also discussed.
  • Keywords
    III-V semiconductors; current density; dislocations; heterojunction bipolar transistors; indium compounds; lattice constants; molecular beam epitaxial growth; semiconductor epitaxial layers; semiconductor growth; semiconductor-insulator boundaries; transmission electron microscopy; Ge; Ge-Si; HBT structures; InP; MBE growth; TEM; antiphase boundaries; buffer layers; current density; current gain cutoff frequency; dislocations; frequency 170 GHz; lattice constant; metamorphic buffer transitions; nucleation; semiconductor growth; Gallium arsenide; Heterojunction bipolar transistors; III-V semiconductor materials; Indium gallium arsenide; Indium phosphide; Lattices; Molecular beam epitaxial growth; Optical buffering; Optical microscopy; Substrates; GeOI/Si; Heterogenuous integration; InP-HBT on Si; MBE;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 2008. IPRM 2008. 20th International Conference on
  • Conference_Location
    Versailles
  • ISSN
    1092-8669
  • Print_ISBN
    978-1-4244-2258-6
  • Electronic_ISBN
    1092-8669
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2008.4703007
  • Filename
    4703007