• DocumentCode
    1814653
  • Title

    Modeling of Bandgap Narrowing for Consistent Simulation of SiGe HBTs Across a Wide Temperature Range

  • Author

    Luo, Lan ; Niu, Guofu ; Cressler, John D.

  • Author_Institution
    Auburn Univ., Auburn
  • fYear
    2007
  • fDate
    Sept. 30 2007-Oct. 2 2007
  • Firstpage
    123
  • Lastpage
    126
  • Abstract
    We investigate the modeling of bandgap narrowing (BGN) for consistent TCAD simulation of SiGe HBTs across wide temperature ranges. At present, such consistency can only be achieved near room temperature in commercial device simulators, because of the inconsistent accounting of the temperature dependence of the Fermi-Dirac statistics correction factor to the effective bandgap. A consistent Fermi-Dirac statistics correction to the bandgap is proposed and implemented in Sentaurus (previously DESSIS) using a C++ physical modeling interface (PMI), and then compared to measured data for advanced SiGe HBTs. This new BGN correction factor leads to consistent simulation results between Boltzmann and Fermi-Dirac statistics from 77 K to 500 K. Furthermore, we explore the temperature dependence of apparent BGN by comparison of simulation and measured data.
  • Keywords
    C++ language; electronic engineering computing; heterojunction bipolar transistors; statistical analysis; technology CAD (electronics); BGN correction factor; Boltzmann statistics; C++ physical modeling interface; DESSIS; Fermi-Dirac statistics correction factor; HBT; Sentaurus; SiGe; TCAD simulation; bandgap narrowing modeling; device simulators; effective bandgap; temperature 77 K to 500 K; Bipolar transistors; Doping; Germanium silicon alloys; Photonic band gap; Silicon germanium; Solid modeling; Statistics; Temperature dependence; Temperature distribution; USA Councils; SiGe HBTs; bandgap narrowing (BGN); device simulation; physical modeling interface;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Bipolar/BiCMOS Circuits and Technology Meeting, 2007. BCTM '07. IEEE
  • Conference_Location
    Boston, MA
  • ISSN
    1088-9299
  • Print_ISBN
    978-1-4244-1019-4
  • Electronic_ISBN
    1088-9299
  • Type

    conf

  • DOI
    10.1109/BIPOL.2007.4351851
  • Filename
    4351851