• DocumentCode
    1814924
  • Title

    InAs quantum wires on InP substrate for VCSEL applications

  • Author

    Lamy, J.M. ; Paranthoen, C. ; Levallois, C. ; Nakkar, A. ; Folliot, H. ; Dehaese, O. ; Corre, A. Le ; Loualiche, S. ; Castany, O. ; Dupont, L.

  • Author_Institution
    Lab. FOTON-INSA, Rennes
  • fYear
    2008
  • fDate
    25-29 May 2008
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Quantum dash based vertical cavity surface emitting lasers (VCSEL) on InP substrate are presented. Single and close stacking layers were successfully grown with molecular beam epitaxy. Optimized quantum dash layers exhibit a strong polarized 1.55 mum photoluminescence along the crystallographic axis. Continuous wave laser emission is demonstrated at room temperature for the first time on a quantum dash VCSEL structure on InP susbtrate. The quantum dash VCSEL laser polarization appears stable on the whole sample and with excitation, no switching is observed. Its polarization is mainly oriented along, an extinction coefficient of 30 dB is measured. Those preliminary results demonstrate the interests of quantum dashes in the realization of controlled and stable polarization VCSEL devices.
  • Keywords
    III-V semiconductors; indium compounds; laser cavity resonators; light polarisation; molecular beam epitaxial growth; photoluminescence; semiconductor quantum wires; surface emitting lasers; InAs; InP; VCSEL; continuous wave laser emission; crystallographic axis; extinction coefficient; laser polarization; molecular beam epitaxy; photoluminescence; quantum dash based vertical cavity surface emitting lasers; quantum dash layers; quantum wires; stacking layers; wavelength 1.55 mum; Indium phosphide; Molecular beam epitaxial growth; Photoluminescence; Polarization; Quantum dots; Stacking; Substrates; Surface emitting lasers; Vertical cavity surface emitting lasers; Wires; InP; VCSEL; polarization; quantum dashes;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 2008. IPRM 2008. 20th International Conference on
  • Conference_Location
    Versailles
  • ISSN
    1092-8669
  • Print_ISBN
    978-1-4244-2258-6
  • Electronic_ISBN
    1092-8669
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2008.4703028
  • Filename
    4703028