DocumentCode :
1814941
Title :
InP nanowires grown on Silicon and SrTiO3 by VLS assisted MBE
Author :
Naji, K. ; Dumont, H. ; Saint-Girons, G. ; Robach, Y. ; Rojo-Romeo, P. ; Bru-Chevallier, C. ; Gendry, M. ; Patriarche, G.
Author_Institution :
Inst. des Nanotechnol. de Lyon (INL), CNRS, Lyon
fYear :
2008
fDate :
25-29 May 2008
Firstpage :
1
Lastpage :
4
Abstract :
In this report, we show experimental results on the growth and characterization of InP nanowires (NWs) grown on silicon and SrTiO3 substrates by solid source molecular beam epitaxy (SSMBE) using Au-assisted catalytic growth. Our objective is to study the effect of a thin crystalline oxide template on the nucleation and growth orientation of the InP NWs. Various growth parameters such as growth temperature and phosphorous pressure were studied to control the NWs growth. Structural and optical properties of the InP NWs are also studied by photoluminescence and transmission electron microscopy.
Keywords :
III-V semiconductors; catalysis; indium compounds; molecular beam epitaxial growth; nanotechnology; nanowires; nucleation; photoluminescence; semiconductor growth; semiconductor quantum wires; transmission electron microscopy; InP; Si; SrTiO3; catalytic growth; growth orientation; nanowires; nucleation; photoluminescence; solid source molecular beam epitaxy; transmission electron microscopy; Crystallization; Indium phosphide; Molecular beam epitaxial growth; Nanowires; Optical microscopy; Pressure control; Silicon; Solids; Substrates; Temperature control; InP/Si nanowires; VLS; oxide template; solid source MBE;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 2008. IPRM 2008. 20th International Conference on
Conference_Location :
Versailles
ISSN :
1092-8669
Print_ISBN :
978-1-4244-2258-6
Electronic_ISBN :
1092-8669
Type :
conf
DOI :
10.1109/ICIPRM.2008.4703029
Filename :
4703029
Link To Document :
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