DocumentCode :
1814947
Title :
Physics-Based Scalable Modeling of GaAs HBTs
Author :
Hu, Juntao ; Zampardi, P.J. ; Cismaru, C. ; Kwok, K. ; Yang, Y.
Author_Institution :
Skyworks Solutions, Newbury Park
fYear :
2007
fDate :
Sept. 30 2007-Oct. 2 2007
Firstpage :
176
Lastpage :
179
Abstract :
While physics-based scalable models are commonplace in the Si industry, there has been little work on applying these techniques to III-V HBTs. The diversification of performance requirements for various handset standards presents an excellent opportunity for GaAs to adopt and even improve upon this modeling methodology. In this work we will present the implementation and application of physics-based scalable models to materials from a GaAs HBT manufacturing line. The application of this methodology has greatly reduced the time, effort, and expense of generating HBT models for multiple material structures using a given technology generation.
Keywords :
III-V semiconductors; elemental semiconductors; gallium arsenide; heterojunction bipolar transistors; silicon; HBT models; Si industry; handset standards; Circuit synthesis; Doping; Fabrication; Gallium arsenide; Heterojunction bipolar transistors; Inorganic materials; Semiconductor device modeling; Semiconductor diodes; Silicon; Virtual manufacturing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Bipolar/BiCMOS Circuits and Technology Meeting, 2007. BCTM '07. IEEE
Conference_Location :
Boston, MA
ISSN :
1088-9299
Print_ISBN :
978-1-4244-1019-4
Electronic_ISBN :
1088-9299
Type :
conf
DOI :
10.1109/BIPOL.2007.4351863
Filename :
4351863
Link To Document :
بازگشت