Title :
Investigation on high catalytic activity mechanism of organopalladium catalyst on S-terminated GaAs(001)-(2×6) surface
Author :
Konishi, T. ; Tojo, T. ; Ishikawa, T. ; Tsukamoto, S. ; Bell, G.R.
Author_Institution :
Anan Nat. Coll. of Technol., Anan
Abstract :
Organopalladium molecules immobilized on the S-terminated GaAs(001), termed GaAs-S-{Pd}, have high catalytic activity and stability in the Heck reaction. It is thought that the presence of Ga-S bonds in the single atomic layer S-termination is essential for these catalytic properties despite the much higher thickness (~100 nm) of the organopalladium films. In this study, we demonstrate the retention of Ga-S bonds in ultra-thin GaAs-S-{Pd} by using reflection high-energy electron diffraction (RHEED) and scanning tunnelling microscopy (STM) to show that the organopalladium molecules are immobilized on an intact S-terminated GaAs(001)-(2times6) surface.
Keywords :
III-V semiconductors; bonds (chemical); catalysis; gallium arsenide; molecular beam epitaxial growth; organometallic compounds; palladium compounds; reflection high energy electron diffraction; scanning tunnelling microscopy; surface reconstruction; (2times6) reconstruction structure; GaAsS; high catalytic activity mechanism; molecular beam epitaxy; organopalladium catalyst; reflection high-energy electron diffraction; scanning tunnelling microscopy; single atomic layer sulphur termination; sulphur-terminated GaAs(001)-(2times6) surface; Atomic layer deposition; Diffraction; Molecular beam epitaxial growth; Optical reflection; Palladium; Scanning electron microscopy; Stability; Substrates; Surface reconstruction; Tunneling; Palladium acetate; RHEED; STM; gallium arsenide; molecular beam epixtaxy; organometallic catalyst; sulphur termination;
Conference_Titel :
Indium Phosphide and Related Materials, 2008. IPRM 2008. 20th International Conference on
Conference_Location :
Versailles
Print_ISBN :
978-1-4244-2258-6
Electronic_ISBN :
1092-8669
DOI :
10.1109/ICIPRM.2008.4703069