A pyramidal silicon probe with an extremely high throughput and resolution for optical near field technology

Author

Yatsui, T. ; Kourogi, Masakatsu ; Ohtsu, M.

Author_Institution

Ohtsu Project, Japan Sci. & Technol. Corp., Tokyo, Japan

fYear

2001

fDate

11-11 May 2001

Firstpage

51

Lastpage

52

Abstract

Summary form only given. For improvement in the performances of spatially resolved spectroscopy, optical data storage, and so on, we demonstrate here an extremely high throughput and resolution capability of a pyramidal silicon probe for near-field optical microscopy. Since the high refractive index of the silicon (n=3.67, @ /spl lambda/=830 nm) leads to a short effective wavelength inside the probe, which results in high throughput and spatial resolution compared to conventional fiber probes.

Keywords

image resolution; micro-optics; nanotechnology; near-field scanning optical microscopy; optical fabrication; optical pumping; probes; silicon; Si; high refractive index; high throughput; near-field optical microscopy probes; pyramidal silicon probe; resolution capability; short effective wavelength; silicon; spatial resolution; Memory; Optical microscopy; Optical refraction; Optical variables control; Probes; Silicon; Spatial resolution; Spectroscopy; Throughput; Ultraviolet sources;

fLanguage

English

Publisher

ieee

Conference_Titel

Quantum Electronics and Laser Science Conference, 2001. QELS '01. Technical Digest. Summaries of Papers Presented at the

Conference_Location

Baltimore, MD, USA

Print_ISBN

1-55752-663-X

Type

conf

DOI

10.1109/QELS.2001.961839

Filename

961839