Title :
A pyramidal silicon probe with an extremely high throughput and resolution for optical near field technology
Author :
Yatsui, T. ; Kourogi, Masakatsu ; Ohtsu, M.
Author_Institution :
Ohtsu Project, Japan Sci. & Technol. Corp., Tokyo, Japan
Abstract :
Summary form only given. For improvement in the performances of spatially resolved spectroscopy, optical data storage, and so on, we demonstrate here an extremely high throughput and resolution capability of a pyramidal silicon probe for near-field optical microscopy. Since the high refractive index of the silicon (n=3.67, @ /spl lambda/=830 nm) leads to a short effective wavelength inside the probe, which results in high throughput and spatial resolution compared to conventional fiber probes.
Keywords :
image resolution; micro-optics; nanotechnology; near-field scanning optical microscopy; optical fabrication; optical pumping; probes; silicon; Si; high refractive index; high throughput; near-field optical microscopy probes; pyramidal silicon probe; resolution capability; short effective wavelength; silicon; spatial resolution; Memory; Optical microscopy; Optical refraction; Optical variables control; Probes; Silicon; Spatial resolution; Spectroscopy; Throughput; Ultraviolet sources;
Conference_Titel :
Quantum Electronics and Laser Science Conference, 2001. QELS '01. Technical Digest. Summaries of Papers Presented at the
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
1-55752-663-X
DOI :
10.1109/QELS.2001.961839
