Title :
Resistance extraction along the current flow
Author :
Ladage, Lorenz ; Leupers, Rainer
Author_Institution :
Luhrstuhl Inf., Dortmund Univ., Germany
Abstract :
A novel algorithm for calculating the resistance of an arbitrarily shaped polygon within a VLSI mask layout analysis program is presented. In contrast to earlier approaches, no polygon decomposition is required. Instead, the current flow is determined by a routing algorithm. The resistance approximation is derived from the current flow. Experimental results have shown that this algorithm achieves more accurate results in comparatively little time. The average run time is small enough so that the algorithm can be used in a VLSI environment
Keywords :
circuit layout CAD; CAMBIO CAD system; VLSI mask layout analysis program; arbitrarily shaped polygon; average run time; current flow; full custom layouts; geometric IC layout optimisation; resistance extraction; routing algorithm; Charge carriers; Equations; Roentgenium; Routing;
Conference_Titel :
Custom Integrated Circuits Conference, 1993., Proceedings of the IEEE 1993
Conference_Location :
San Diego, CA
Print_ISBN :
0-7803-0826-3
DOI :
10.1109/CICC.1993.590741