DocumentCode :
1817542
Title :
Deep level transient spectroscopy study of defects at Si/SiO2 and Si/Si3N4 interfaces
Author :
Johnson, B.C. ; Rahman, H.U. ; Gauja, E. ; Ramer, R. ; McCallum, J.C.
Author_Institution :
Australian Res. Council Centre of Excellence for Quantum Comput. Technol., Univ. of Melbourne, Parkville, VIC, Australia
fYear :
2010
fDate :
22-26 Feb. 2010
Firstpage :
333
Lastpage :
336
Abstract :
The properties of traps at SiO2/Si and Si3N4/Si interfaces were examined and compared using deep level transient spectroscopy (DLTS). Small pulse DLTS was used to determine the effective electron capture cross-section of the interface states. Similar trends are found for both systems with the capture cross-section decreasing rapidly towards the band edge. The effective capture cross-section and energy level is also given for the Si≡Si3 defect at the Si3N4/Si interface.
Keywords :
deep level transient spectroscopy; interface states; silicon; silicon compounds; Si-Si3N4; Si-SiO2; band edge; deep level transient spectroscopy; electron capture cross section; energy level; interface defects; interface states; interface traps; small pulse DLTS; Films; Interface states; Physics; Silicon; Silicon compounds; Temperature measurement; Transient analysis; Deep level transient spectroscopy; cross-section; interface trap density; silicon nitride;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanoscience and Nanotechnology (ICONN), 2010 International Conference on
Conference_Location :
Sydney, NSW
Print_ISBN :
978-1-4244-5261-3
Electronic_ISBN :
978-1-4244-5262-0
Type :
conf
DOI :
10.1109/ICONN.2010.6045257
Filename :
6045257
Link To Document :
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