DocumentCode :
1817553
Title :
PMMA photonic crystals for waveguiding applications
Author :
Dragoman, Daniela ; Dinescu, Adrian ; Müller, Raluca ; Kusko, Cristian ; Herghelegiu, Alex ; Kusko, Mihai
Author_Institution :
Nat. Inst. for R&D in Microtechnologies
Volume :
1
fYear :
2008
fDate :
13-15 Oct. 2008
Firstpage :
85
Lastpage :
88
Abstract :
This paper describes the fabrication of two- dimensional photonic crystals (PCs) obtained by direct patterning of positive PMMA electronoresist, using the electron-beam lithography technique (EBL). We design, fabricate and simulate a passive optical structure: a channel PC waveguide, to be used in integrated optic applications. The fabrication of the device is a challenge because we integrated the PC waveguide configuration with a taper optical waveguide on the same substrate. The finite difference time domain (FDTD) simulations were used to predict the optical behavior, and in particular the band gap, of the investigated structure.
Keywords :
optical waveguides; photonic crystals; 2D photonic crystals; FDTD; PMMA photonic crystals; channel PC waveguide; direct patterning; electron-beam lithography technique; finite difference time domain simulations; integrated optic applications; optical waveguide; passive optical structure; positive PMMA electronoresist; waveguiding applications; Finite difference methods; Integrated optics; Lithography; Optical design; Optical device fabrication; Optical devices; Optical waveguides; Personal communication networks; Photonic crystals; Time domain analysis;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Conference, 2008. CAS 2008. International
Conference_Location :
Sinaia
ISSN :
1545-827X
Print_ISBN :
978-1-4244-2004-9
Type :
conf
DOI :
10.1109/SMICND.2008.4703333
Filename :
4703333
Link To Document :
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