DocumentCode
1818338
Title
Ionization-assisted deposition of alkylacrylate and fluorinated alkylacrylate polymer thin films
Author
Usui, H. ; Katayama, A. ; Honda, T. ; Tanaka, K.
Author_Institution
Dept. of Mater. Syst. Eng., Tokyo Univ. of Agric. & Technol., Japan
Volume
1
fYear
2003
fDate
1-5 June 2003
Firstpage
104
Abstract
Polymeric thin films were prepared by the ionization-assisted deposition (IAD) from alkylacrylate source materials. Deposition of n-octadecyl acrylate resulted in formation of comb-like acryl polymer having long alkyl side chain. The polymer yield increased with increasing electron emission current for the IAD. For the preparation of fluorinated polymer thin films, 1H,1H,11H-eicosafluoroundecyl acrylate was used as the source material. While no films were obtained by the conventional evaporation method, insoluble thin films were deposited by the IAD. The deposited film had TeflonR-like feature of large water contact angle.
Keywords
contact angle; electron emission; ion beam assisted deposition; polymer films; wetting; Teflon like properties; alkylacrylate; comb-like acryl polymer; conventional evaporation method; electron emission current; fluorinated alkylacrylate polymer thin films; hydrophobic properties; insoluble thin films; ionization assisted deposition; n-octadecyl acrylate; water contact angle; Acceleration; Agricultural engineering; Chemical vapor deposition; Electrons; Impurities; Microstructure; Polyethylene; Polymer films; Solvents; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Properties and Applications of Dielectric Materials, 2003. Proceedings of the 7th International Conference on
ISSN
1081-7735
Print_ISBN
0-7803-7725-7
Type
conf
DOI
10.1109/ICPADM.2003.1218363
Filename
1218363
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