DocumentCode :
1818997
Title :
Model for the low frequency electrical relaxation in Si porous
Author :
Dafinei, A.A. ; Ioanid, Ana ; Dafinei, A.S.
Author_Institution :
Fac. of Phys., Univ. of Bucharest, Bucharest
Volume :
2
fYear :
2008
fDate :
13-15 Oct. 2008
Firstpage :
257
Lastpage :
260
Abstract :
In an non-homogenous dielectric, in the low frequency range, the polarization properties due to the free charge kinetic modifies as function of the accumulation and redistribution of this space charge on inhomogeneities. The relaxation of these polarization leads to the dispersion of the permittivity and conductivity. We propose a model for the low frequencies conductivity relaxation phenomena in porous Si porous (PS).
Keywords :
dielectric relaxation; electrical conductivity; elemental semiconductors; permittivity; porous semiconductors; silicon; Si; electrical conductivity relaxation; nonhomogenous dielectric; permittivity; polarization properties; porous materials; space charge; Conducting materials; Conductivity; Dielectric materials; Dispersion; Electromagnetic wave polarization; Energy barrier; Frequency; Kinetic theory; Permittivity; Space charge; Effective Medium Approximation (EMA); dispersion; electrical relaxation; non-homogenous dielectric;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Conference, 2008. CAS 2008. International
Conference_Location :
Sinaia
ISSN :
1545-827X
Print_ISBN :
978-1-4244-2004-9
Type :
conf
DOI :
10.1109/SMICND.2008.4703395
Filename :
4703395
Link To Document :
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