DocumentCode :
1819357
Title :
Effects of α-particles irradiation on polycrystalline silicon thin film transistors
Author :
Michalas, L. ; Papaioannou, G.J. ; Voutsas, A.T.
Author_Institution :
Phys. Dept., Univ. of Athens, Athens
Volume :
2
fYear :
2008
fDate :
13-15 Oct. 2008
Firstpage :
301
Lastpage :
304
Abstract :
The effects of alpha-particles irradiation on the electrical properties of poly-Si TFTs are investigated, through the temperature analysis of the transfer characteristics. As indicated by the thermally activated parameters, generation of states deep in the band gap usually attributed to dangling or floating bonds, is responsible for the device degradation. Therefore the OFF state leakage current and the subthreshold swing were found to increase, while the carrierspsila mobility to decrease with the radiation fluence. Furthermore a negative threshold voltage shift is observed attributed to positively charged oxygen vacancies in SiO2 introduced by irradiation.
Keywords :
energy gap; radiation effects; thin film transistors; alpha-particles irradiation; band gap; polycrystalline silicon thin film transistors; temperature analysis; Crystallization; Dielectric thin films; Leakage current; Photonic band gap; Semiconductor films; Silicon; Solid state circuits; Temperature distribution; Thin film transistors; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Conference, 2008. CAS 2008. International
Conference_Location :
Sinaia
ISSN :
1545-827X
Print_ISBN :
978-1-4244-2004-9
Type :
conf
DOI :
10.1109/SMICND.2008.4703409
Filename :
4703409
Link To Document :
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