Title :
Plenary Talk: Applications of electromagnetic metamaterials to vacuum electronics devices and advanced accelerators
Author_Institution :
Univ. of Texas, Austin, TX, USA
Abstract :
The development of high-frequency vacuum electronics structures is hampered by the enormous technological challenges of high-precision three-dimensional machining required for shorter wavelengths. I will describe the possibilities of employing electromagnetic metamaterials (MTMs) to address some of these challenges. In this talk I will first review some of the recent progress in metamaterials-inspired vacuum electronics and accelerating structures. I will then describe two types of metamaterials specifically designed to interact with electron beams. One is the Negative Index Meta-Waveguide (NIMW) [1] that satisfies the following conditions: (a) it is essentially “open” to enable unobstructed electron beam propagation; (b) it supports sub-wavelength modes polarized along the direction of the beam propagation to enable efficient interaction with sub-relativistic (<;20keV) electrons; and (c) it is amenable to simple and standard micro-fabrication that does not involve volumetric machining or high-aspect etching because it consists of a stack of metal planes patterned using complementary metamaterial elements (e.g., split rings).
Keywords :
electromagnetic metamaterials; relativistic electron beams; vacuum microelectronics; MTM; NIMW; accelerating structure; advanced accelerator; beam propagation; complementary metamaterial element; electromagnetic metamaterial application; electron beam interaction; high-aspect etching; high-frequency vacuum electronics structures; high-precision three-dimensional machining; metal plane pattern stack; metamaterials-inspired vacuum electronics; negative index metawaveguide; shorter wavelength; standard microfabrication; subrelativistic electron; subwavelength polarized mode; unobstructed electron beam propagation; vacuum electronics device; volumetric machining; Backscatter; Electromagnetic metamaterials; Electron accelerators; Electron beams; Machining; Metals;
Conference_Titel :
Vacuum Electronics Conference, IEEE International
Conference_Location :
Monterey, CA
DOI :
10.1109/IVEC.2014.6857461