Title :
Ag dependence of holographic grating formation in chalcogenide thin films
Author :
Yeo, Cheol Ho ; Lee, Jung Tae ; Park, Jung Il ; Lee, Yeong Jong ; Chung, Hong Bay
Author_Institution :
Dept. of Electr. Mater. Eng., Kwangwoon Univ., Seoul, South Korea
Abstract :
We have investigated the Ag dependence of holographic grating formation in chalcogenide thin films. Sample was formed by alternating a layer of Ag/As40Ge10Se15S35 and As40Ge10Se15S35/Ag to be increase the photosensitivity. In this study, holographic gratings have been formed using He-Ne laser (632.8 nm) under different polarization combinations (the intensity polarization holography, the phase polarization holography). The diffraction efficiency was obtained by +1st order intensity. As the results, we found the maximum diffraction efficiency in As40Ge10Se15S35/Ag thin film. Also, the maximum diffraction efficiency of the intensity polarization holography (P:P) is 21%.
Keywords :
arsenic compounds; chalcogenide glasses; germanium compounds; holographic gratings; laser beam effects; light polarisation; metallic thin films; multilayers; selenium compounds; semiconductor thin films; silver; sulphur compounds; 632.8 nm; Ag dependence; Ag-AsGeSeS; chalcogenide thin films; diffraction efficiency; first order intensity; holographic grating formation; intensity polarization holography; phase polarization holography; photosensitivity; polarization combinations; Amorphous materials; Anisotropic magnetoresistance; Diffraction gratings; Holographic optical components; Holography; Optical films; Optical polarization; Optical refraction; Optical sensors; Transistors;
Conference_Titel :
Properties and Applications of Dielectric Materials, 2003. Proceedings of the 7th International Conference on
Print_ISBN :
0-7803-7725-7
DOI :
10.1109/ICPADM.2003.1218524
