DocumentCode
182335
Title
Plasma deposited multipactor coating for high power, sapphire, RF windows
Author
Ives, R. Lawrence ; Marsden, D. ; Collins, George ; Lucovsky, Gerry ; Zeller, Daniell ; Schamiloglu, Edl
Author_Institution
Calabazas Creek Res., Inc., San Mateo, CA, USA
fYear
2014
fDate
22-24 April 2014
Firstpage
185
Lastpage
186
Abstract
This program developed a multipactor coating process for single crystal, sapphire, vacuum windows for high power RF transmission. The process replaces sputtered coatings, which are not tightly bonded to the crystal surface. The process creates molecular bonds between the AlO crystal surface and the TiN coating. The process was used to build a sapphire, RF window that was successfully tested to 45 MW.
Keywords
crystals; microwave switches; plasma deposited coatings; sapphire; titanium compounds; Al2O3; RF windows; TiN; high power RF transmission; molecular bonds; plasma deposited multipactor coating; power 45 MW; sapphire; single crystal; sputtered coatings; vacuum windows; Coatings; Crystals; Plasmas; Radio frequency; Surface treatment; Testing; Tin; RF sources; RF windows; multipactor emission; remote plasma processing; sapphire;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Electronics Conference, IEEE International
Conference_Location
Monterey, CA
Type
conf
DOI
10.1109/IVEC.2014.6857552
Filename
6857552
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