Title :
Common shallow ridge waveguide laser-electroabsorption modulator using lateral ion implantation
Author :
Prosyk, K. ; Moore, R.S. ; Williams, P.J. ; Robbins, D.J. ; Haysom, J.E. ; Kearley, M.Q. ; Britton, P. ; Flirth, P. ; Ait-Ouali, A.
Author_Institution :
Bookham Inc., Kanata, Ont., Canada
Abstract :
For the first time, a laser and high-speed modulator are integrated using a common shallow etched ridge waveguide. Ion implantation lateral to the modulator ridge provides electrical isolation suitable for 10 Gb/s long reach, 55 °C operation.
Keywords :
electroabsorption; ion implantation; light absorption; optical communication equipment; optical fibre communication; optical modulation; ridge waveguides; waveguide lasers; 10 Gbit/s; 55 degC; common shallow ridge waveguide laser; electrical isolation; electroabsorption modulator; high-speed modulator; lateral ion implantation; Distributed feedback devices; Etching; Fiber lasers; Ion implantation; Laser feedback; Optical losses; Optical scattering; Optical waveguides; Quantum well lasers; Waveguide lasers;
Conference_Titel :
Optical Fiber Communication Conference, 2005. Technical Digest. OFC/NFOEC
Print_ISBN :
1-55752-783-0
DOI :
10.1109/OFC.2005.192664
