CAD driven high precision E-beam positioning

Author

Kwang, Kent ; Wang, Hsin ; Hu, Arthur ; Asaki, Mitsuyuki ; Niijima, Hironobu

Author_Institution

Advantest America, Inc., Santa Clara, CA, USA

fYear

1993

fDate

17-21 Oct 1993

Firstpage

928

Lastpage

935

Abstract

To shorten the silicon debugging time of VLSI chips with design rules of 0.5 μ or less, an E-beam prober becomes an indispensable tool. However, the accuracy of E-beam positioning has to be greatly improved to the 0.1 μ level so the best waveform can be acquired. To achieve such high precision, we use image processing techniques to do pattern matching between the CAD layout database and the SEM image. We will discuss the methods to filter and segment the SEM image, the methods to do the registration between the CAD layout database and the SEM image, and the method for final beam positioning on the SEM image. We will also reveal some test results

Keywords

VLSI; circuit layout CAD; electron beam applications; electron beam testing; electron microscopy; integrated circuit testing; scanning electron microscopy; 0.1 micron; 0.5 micron; CAD; E-beam positioning; SEM image; Si debugging time; VLSI chips; image processing; layout database; pattern matching; Debugging; Design automation; Filters; Image databases; Image processing; Image segmentation; Pattern matching; Silicon; Testing; Very large scale integration;

fLanguage

English

Publisher

ieee

Conference_Titel

Test Conference, 1993. Proceedings., International

Conference_Location

Baltimore, MD

Print_ISBN

0-7803-1430-1

Type

conf

DOI

10.1109/TEST.1993.470607

Filename

470607