Title :
Rotational control of anisotropic micro-objects by optical pressure
Author :
Higurashi, Eiji ; Ukita, Hiroo ; Tanaka, Hidenao ; Ohguchi, Osamu
Author_Institution :
Interdisciplinary Res Labs., NTT, Tokyo, Japan
Abstract :
Micro-objects having an anisotropic geometry-not bilateral symmetry but rotational symmetry in the horizontal cross section-were fabricated by reactive ion-beam etching (RIBE) of a 10-μm-thick silicon dioxide layer. These artificial micro-objects, suspended in liquid and irradiated by a strongly focused laser beam, rotated about the laser beam axis in the expected direction and the speed of rotation is proportional to the input laser power
Keywords :
sputter etching; 10 mum; RIBE; SiO2; anisotropic geometry; anisotropic micro-objects; artificial micro-object; focused laser beam; horizontal cross section; input laser power; optical pressure; reactive ion-beam etching; rotational control; rotational symmetry; silicon dioxide layer; speed of rotation; Anisotropic magnetoresistance; Geometrical optics; High speed optical techniques; Laser beams; Optical control; Optical refraction; Optical variables control; Power lasers; Pressure control; Shape control;
Conference_Titel :
Micro Electro Mechanical Systems, 1994, MEMS '94, Proceedings, IEEE Workshop on
Conference_Location :
Oiso
Print_ISBN :
0-7803-1833-1
DOI :
10.1109/MEMSYS.1994.555825
